Dr. Satinder Kumar Sharma

Dr. Satinder Kumar Sharma
EMail: satinder[at]iitmandi[dot]ac[dot]in
Address: School of Computing and Electrical Engineering,

Indian Institute of Technology Mandi ,

near Bus Stand, Mandi - 175001

Himachal Pradesh

India
Phone: 01905-237908

Research Interests

  • VLSI Technology :Synthesis and characterization of Multiple thickness gate oxides for SOC system, High-k gate dielectric stacks charge trapping for CMOS Technology and ions irradiated scaled MOSFET for space application, VLSI design for digital and analog circuits, reconfigurable computing, device modeling and simulation, flexible and bio- compatible integration of nano- electronics and piezoelectric materials for MEMS devices etc.

  • Nano Science and Nanotechnology: 1D, 0D nanostructures of ZnO, TiO2 , ZnS, CdSe, CdS, Polyannaline synthesis and characterization of electronic, optical and magnetic properties for various applications. ZnO/PANI coaxial nanostructures for Solar cell application, Functionalized metal/semiconductor nano-particles for Surafce Plasmon,Chemisorptions and Biological Sensors application. Self-organized meso-patterning of polymers, polymer thin films wetting/ dewetting and polymer nanocomposite instability etc.

Employment


  • Faculty in school of Computing and Electrical Engineering at Indian Institute of Technology (IIT)- Mandi, Himachal Pradesh, (India).
  • Faculty in Electronics and Microelectronics Division at Indian Institute of Information Technology-(IIIT)-Allahabad, (India), from 2010-2012.
  • Research Scientist, in DST Unit on Nanosciences at Indian Institute of Technology (IIT)- Kanpur, (India) from 2007-2010.
  • Guest faculty, in Electronics Science Department at Kurukshetra University, Kurukshetra, (India), from 2004-2006.

Education

  • Post Doc. in Nano Science and Nanotechnology from DST Unit on Nanosciences at Indian Institute of Technology (IIT)-Kanpur from 2007- 2010.
  • Ph.D in VLSI Technology from Electronics Science Department, Kurukshetra University, Kurukshetra from 2002-2007.
  • Master in Science in Physics, Electronics Science from department of Physics, Himachal Pradesh University, Shimla from 2000-2002.

Research Project Awarded/Research Award

  • DST Fast Track Young Scientist research award project entitle "Surface Plasmon Based Flexible Colloidal Crystal Sensors" from the Engineering Section from the Department of Science and Technology (DST), New Delhi. 2012-2015 .

  • Intel, Semiconductor Research Corporation (U.S.A) 1101 Slater Road, Brighton Hall, Suite 120, Durham, NC 27703 P.O. Box 12053, Research Triangle Park, NC-27709-2053 "Non Chemically Amplified Resists for EUVL at the 10 nm Node and Beyond" $ 351000.0 , 2012-2015 .

  • Indian Institute of Technology(IIT),Mandi,Seed GrantProject "Radiation Impact on SiC based Devices for Space Applications", 2013-2016 .

  • PAN IIT-DST, Solar Energy Research Initiative, project entitled "Dye Sensitized Hybrid Solar Cells with Up-Conversion Nanostructures with Enhanced Efficiency", from the Department of Science and Technology (DST), New Delhi, 2012-104 .

Research Instruments Fabricated/Handling Exposure

  • Indigenous fabricated Sputtering and PECVD system available at Nanosciences at IITK
  • SNOM/Confocal/μ-Raman
  • Conventional Lithography and Mask Less Photolithography (MLP)
  • Nano-Imprint Lithography (NIL)
  • Atomic Force Microscope (AFM)
  • RF Magnetron Sputtering system (VICO)
  • Plasma Enhanced Chemical Vapou Depaostion System (PECVD)
  • U-V Visible, FTIR
  • Field Emmision Scanning Electron Microscopy (FESEM)
  • Ellipesometer, Optical profillometer
  • Physical Vapor Deposition (PVD)
  • Kethley C-V Analyser
  • Kethley I-V Analyser
  • Electrochemical Deposition (Auto Lab)

List of Publications in International Journals

In Journals

  • Templated Electrochemical Synthesis of Polyaniline/ZnO Coaxial Nanowires with Enhanced Photoluminescence, Neelam Saurakhiya, Satinder K. Sharma, Rudra Kumar, and Ashutosh Sharma,Industrial & Engineering Chemistry Research (I & EC, Research), 27,(2014), dx.doi.org/10.1021/ie500989m, Impact factor 2.25.

  • Design and synthesis of novel resist materials for EUVL, presented, V. S. V. Satyanarayana, Vikram Singh, Subrata Ghosh, Satinder Sharma, Kenneth E. Gonsalves, Proc. of SPIE Vol. 9048, 90481W . (2014) SPIE . CCC code: 0277-786X/14/$18. DOI: 10.1117/12.2045736.

  • Tuning of structural, optical, and magnetic properties of ultrathin and thin ZnO nanowire arrays for nano device applications, Satinder K. Sharma, Neelam Saurakhiya, Sumit Barthwal, Rudra Kumar and Ashutosh Sharma, Nanoscale Research Letters (2014), 9:122, http:// www. nano scalereslett.com/content/9/1/122 Impact factor 2.55.

  • Organic-Inorganic Hybrid Resists for EUVL, Vikram Singh, Vishwanath Kalyani, V. S. V. Satynarayana, Pradeep Parameswaran, Subrata Ghosh, Satinder K. Sharma, Kenneth E. Gonsalves, Proc. of SPIE Vol. 9051, 90511W. (2014) SPIE. CCC code: 0277-786X/14/$18. DOI:10.1117/12.2041907.

  • A Switch-Capacitor DAC Successive Approximation ADC Using Regulated Clocked Current Mirror, Ashish Joshi, Satinder Sharma, Sanjeev Manhas and S. Dasgupta,International Journal of Electronics and Electrical Engineering (IJEEE), Vol.2 No.1, (2014). Doi:10.12720 / ijeee. 2.1. 50-55.

  • Novel non-Chemical Amplified (n-CARs) Negative Resists for EUVL, Vikram Singh, V. S. V. Satyanarayana, Satinder K. Sharma, Subrata Ghosh, Kenneth E. Gonsalves,Advances in Patterning Materials and Processes Proc. of SPIE Vol.9051,905106. (2014) SPIE .CCC code: 0277-786X/14/$18. Doi: 10.1117/12.2041183.

  • Towards Novel non-Chemically Amplified (n-CARS) Negative Resists for Electron Beam Lithography Applications. Vikram Singh, V. S. V. Satyanarayana, Satinder K. Sharma, Subrata Ghosh,Kenneth E. Gonsalves, J.Mater.Chem.C, (2014),2,2118-2122.DOI: 10.1039/c3tc31826e. Impact factor 6.2.

  • Optimization of processing parameters and metrology for novel NCA negative resist for NGL, Vikram Singh, V. S. V. Satyanarayana, Felipe Kessler, Francine R. Scheffer, Daniel E. Weibel, Satinder K. Sharma , Subrata Ghosh, Kenneth E. Gonsalves,Proc.of SPIE Vol.9048,90481Y. (2014) SPIE . CCC code: 0277-786X/14/$18. DOI: 10.1117/12.2045882 .

  • PZT-PDMS composite for active damping of vibrations, Satinder K. Sharma, Himani Gaur, Manish Kulkarni, Ganesh Patil, Bishakh Bhattacharya, Ashutosh Sharma, Composites Science and Technology, 77, 42-51, (2013). http://dx.doi.org/10.1016/j.compscitech.2013.01.004 Impact factor 3.9 .

  • PECVD based silicon oxynitride thin ?lms for nano photonic on chip interconnects applications, Satinder K. Sharma, Sumit Barthwal, Vikram Singh, Anuj Kumar, Prabhat K. Dwivedi, B. Prasad, Dinesh Kumar, Micron 44, 339-346, (2013).http://dx.doi.org /10.1016/j. micron. (2012). 08.006 Impact factor 2.1 .

  • Antimicrobial Properties of Electro-ChemicallyStabilized Organo-Metallic Thin, Kumud Kant Awasthi, Anjali Awasthi, Kamakshi, Narain Bhoot, P. J.John, Satinder K. Sharma, and Kamlendra Awasthi, Advanced Electrochemistry, 6,1-6, (2013).http://doi:10.1166/adel.2013.1013 Impact factor 1.2 .

  • Silicon Oxynitride Thin Films for Nano Photonic On Chip Interconnects Applications, Satinder K. Sharma,Sumit Barthwal, Vikram Singh, Anuj Kumar, Journal of Micron (2012), doi./10.101/j.micron.(2012).X.002 Impact factor 1.8 .

  • Surface disordering and its correlations with properties in argon implanted CR-39 polymer, Nidhi Shekhawat, Sanjeev Aggarwal,Annu Sharma, Satinder K. Sharma, S. K. Deshpande, and K. G. M. Nair, Journal of Applied Physics 109, 083513 (2011), http://dx.doi.org/10.1063/1. 3573480 Impact factor 2.4 .

  • Study of Rapid Thermal Annealing on Ultra Thin High-K HfO2 Films Properties for nano Scaled MOSFET Technology, Vikram Singh, Satinder K. Sharma Dinesh Kumar , R.K. Nahar, (2011), Microelectronics Engineering B. doi:10.1016/j.mee.2011.09.005,(2011) Impact factor 1.7.

  • Frequency Dependence Studies on the Interface Trap Density and Series Resistance of HfO2 Gate Dielectric Deposited on Si Substrate: Before and After 50MeV Li3+ Ions Irradiation, (2011), Vikram Singh, N. Shashank, Satinder K. Sharma,Dinesh Kumar,R.K. Nahar, Nuclear Instruments and Methods in Physics Research B. doi :10. 1016/j.nimb. (2011).08.025.Impact factor 1.2.

  • Large scale synthesis of polyaniline nanowires and their characterization, Sanjeev Kumar and Satinder K. Sharma, (2011) Journal of Materials Science: Materials in Electronics, (2011) doi: 10.1007/s10854-011-0583-7, Impact factor 1.2 .

  • High-k Dielectric Stacks Charge Trapping for CMOS Technology, Satinder K. Sharma, B.rasad and Dinesh Kumar, Material Science and Engineering B, 166, 170-173 (2010), doi:10.1016/j.mseb.2009.11.002. Impact factor 2.7 .

  • One Step Electrodeposition of High Aspect Ratio n-type ZnO Nanowire Arrays, Satinder K. Sharma, Amritha Rammohan and Ashutosh Sharma. Journal of Colloidal and Interfacial Science, (2010), doi:10.1016/j.jcis.2009.12.026. Impact factor 3.5..

  • Stability and Dewetting of Metal Nanoparticles Filled Thin Polymer Films: Control of Instability Length scale and Dynamics,Rabibrata Mukherjee,Soma Das,Anindya Das, Satinder K. Sharma,Arup K. Raychaudhuri and Ashutosh Sharma, (2010),published in ACS NANO, http://acsnano.org/rich2/ynn-nn/ynn99907/ynn3399d07z,2010 Impact factor 10.0 .

  • Nickel silicide formation by electroless technique for ULSI technology, Anuj Kumar, Mukesh Kumar, Amanpal Singh, Satinder Kumar, Dinesh Kumar, Microelectronic Engineering, 87, 286-289 (2010),doi:10.1016/j.mee.2009.07.021. Impact factor 1.8.

  • Changes in Structural and Optical Properties of Polycarbonate Induced by Ag+ Ion Implantation, Suman Bahniwal, Annu Sharma, Sanjeev Aggarwal, S.K. Deshpande, Satinder K. Sharma, K.G.M.Nair, Journal of Macromolecular Science, Part B, 49, 2, 259-268 (2010),doi: 10.1080/00222340903352252. Impact factor 1.0.

  • Large scale synthesis of cadmium selenide nanowires using template synthesis technique and their Characterization, Sanjeev Kumara, Vijay Kumar, Satinder K. Sharma, S.K. Sharma, S.K. Chakarvarti, Superlattices and Microstructures,(2010), 1-9,doi.org/10.1016/j.spmi .2010.03.008. Impact factor 1.3.

  • Low-temperature synthesis and characterization of cadmium sulphide nanowires grown using simple chemical reaction through the pores in an alumina template, Sanjeev Kumar and Satinder K. Sharma, (2010), IOP Publishing Phys. Scr. 82 (2010) 000000 (4pp) http:// stacks.iop.org/PhysScr/82/000000. Impact factor 1.0.

  • Alteration of Gate Oxides Thickness for SOC Level Integration, Satinder K. Sharma, B. Prasad , Dinesh Kumar and Rajkumar, Materials Science in Semiconductor Processing, 12, 99, (2009),doi:10.1016/j.mssp.(2009).08.003. Impact factor 1.2.

  • Growth and Characterization of Large-Scale Uniform Zinc Sulfide Nanowires by Simple Chemical Reaction Technique Sanjeev Kumar,Satinder K. Sharma,Superlattices and Microstructures,(2009),doi:10.1016/j.spmi.(2009).08.008. Impact factor 1.3.

  • Multiple thickness gate oxides with fluorine implantation for system on chip applications , Satinder K. Sharma, B.Prasad,Dinesh Kumar,RajKumar, Vacuum,83,1359, (2009),doi:10.1016/j.vacuum.(2009).04.045. Impact factor 1.5.

  • Structural and optical characterization of ZnO thin films deposited by sol-gel method A. Singh, A. Kumar, N. Suri, S. Kumar, M. Kumar, P. K. Khanna, D. Kumar, Journal of Optoelectronics and Advanced Materials (JOM), 790-793 (2009).Impact factor 0.9.

  • Surface topography and morphology characterization of PIII irradiated silicon surface,Satinder K. Sharma and Sumit Barthwal, Applied Surface Science, 17552 (1-6).(2008), doi:10.1016/j.apsusc.2008.07.129.Impact factor 2.0.

Published / presented in the International/National Conferences

  • Silicon Oxynitride-Future Gate Material, Satinder K. Sharma, B. Prasad, Dinesh Kumar and P.J.George, National Conference on Materials and Related Technologies held at Thapar Institute of Engineering and Technology, Patiala, ep19-20, 2003 Published as special proceedings.

  • Application of Plasma Immersion Ion Implantation Technique for Oxynitride Growth as a Gate Dielectric in Sub Micron MOS Devices, Satinder K. Sharma,B. Prasad, Dinesh Kumar and P.J.George, National Conference on Materials and Their Applications held at Kurukshetra University (2004).

  • Impact of Post-metallization annealing on the Fluorinated Ultra Thin Gate Oxide in Submicron MOS Devices,Satinder K. Sharma, Rajkumar, B. Prasad, Dinesh Kumar and P.J.George, Indian Microelectronics Society Conference held at Kurukshetra University, February 17-18, (2006).

  • High Frequency Simultaneous Measurement for Rapid Characterization of MIS Structure, Satinder K. Sharma, Anil Dutt,B. Prasad, Dinesh Kumar and P.J.George, National Conference On Recent Advances in Process Control & Instrumentation Engineering held at Kurukshetra University, February 23-25, (2006).
  • Fabrication of MOS structure by wet oxidation of MBE grown AlAs/InAS, Dinesh Kumar, Satinder K. Sharma, Anita Rani, B. Prasad and Mukesh Kumar, National Conference held at Kurukshetra University, September (2006).

  • Effect of Post Metallization Annealing on hysterisis of C-V and G-V characteristics of PECVD deposited silicon oxynitride thin films, Satinder K. Sharma, Dinesh Kumar and B.Prasad, National Conference held at Kurukshetra University, Sep. (2006).

  • Role of +19F Implanted to Grow Multiple Gate Oxides for Nano-CMOS Technology, Satinder K. Sharma,B. Prasad, Dinesh Kumar and Rajkumar, International Conference on Micro and Nanotechnology held at University of Mouloud Mammeri Of TIZI-OUZOU, ALGERIA, November 19-23 (2006).

  • Electrical Characteristics of SiOxNy/HfO2 Stack Structure for High Performance Sub- micron CMOS Devices (INCCOM-6), Satinder K. Sharma, B. Prasad and Dinesh Kumar, International Conference on Future Trends in Composite Materials and Processing, at Indian Institute of Kanpur (U.P) from December 12-14,(2007).

  • Experimental Determination of Threshold Voltage Shift in Submicron Devices,Satinder K. Sharma, Anuj Kumar, B. Prasad and Dinesh Kumar, to be held at 52nd DAE Solid State Physics Symposium, Department of Studies in Physics, University of Mysore, MYSORE, from 27-31 December 2007.

  • Synthesis of nano-crystalline ZnO thin film by Sol-Gel technique, Amanpal Singh, Anuj Kumar,Satinder Kumar, Mukesh Kumar, P.K. Khanna and Dinesh Kumar National conference on semiconductor materials and technology to be held at Gurukula Kangri Vishwavidyalaya Haridwar India,16-18 October 2008.

  • Deposition and characterization of electroless Ni-Co-P alloy thin film, Anuj Kumar, Amanpal Singh, Satinder Kumar, Mukesh Kumar, B. Prasad and D. Kumar National conference on semiconductor materials and technology, held at Gurukula Kangri Vishwavidyalaya Haridwar India,16-18 October 2008.

  • The evolution of phase transformation during annealing of electroless Ni-Co-P alloy thin Film, Anuj Kumar, Amanpal Singh, Satinder Kumar, Mukesh Kumar, B. Prasad and Dinesh Kumar, National Conference on Photonics & Material Science, Guru Jambheshwer University, Hisar, Haryana, India, October 24-25,2008.

  • Raman study on NiSi formation by Electroless for ULSI technology, Anuj Kumar, Mukesh Kumar, Amanpal Singh, Satinder Kumar, B. Parsad and D. Kumar Ist Rashtreeya Yuva Vaigyanik Sammelan organized by National Institute of Technology, Kurukshetra, Haryana, India, 28-30 November, 2008.

  • Synthesis and Characterisation of Erbium Nano Particle doped High k Dielectric Thin film for Novel device Applications, Vikram Singh, Satinder Kumar, Dinesh Kumar, R.K. Nahar, at XI international conference on advanced materials (ICAM-09) at Rio de Janeiro Brazil, Sept 2009.

  • Templated electrodeposition of ZnO nanowires array for bio sensing application,Satinder K. Sharma, Amritha Rammohan and Ashutosh Sharma, Golden Jublilee Symposium on fabrication at small scale and INDO-US conference on fabrionics, organized by IIT -Kanpur, U.P. India, 9-12 December,2009.

  • Polyaniline 1D Nanostructures film formation by electrochemical deposition for Biomedical Applications, Neelam Saurakhiya, Satinder K. Sharma and Ashutosh Sharma, at International Conference on Nano Science and Technology(ICONSAT)2010, held at IIT Bombay, Mumbai, India, 17-20,February, 2010.

  • Chalcogenide Glass Photoresists for Grayscale Patterning Prabhat K. Dwivedi,Satinder K. Sharma, Amritha Rammohan and Ashutosh Sharma at the 55th DAE Solid State Physics Symposium 2010, India.

  • Effects of Post-Deposition Annealing on the Material and Electrical Characteristics of Sputtered Ultrathin HfO2 Film on Silicon, Vikram Singh,Satinder K. Sharma, R.K. Nahar , Dinesh Kumar; presented in 16th International Workshop on The Physics of Semi Conductor Devices,2011 at Indian Institute of Technology-Kanpur, India.

  • Radial hetrojunction formation of ZnO-Polyaniline coaxial nanowires via electrochemical route, Neelam Saurakhiya , Satinder Kumar Sharma, Ashutosh Sharma, presented at International Conference on Nanoscience and Technology (ICONSAT - 2012) January 20 to 23, 2012 at Hyderabad, India.

  • Ultrathin HfO2 based CMOS for space application, Vikram Singh,Satinder K. Sharma,R.K. Nahar , Dinesh Kumar; will be presented at International conference on nano materials and Nanotechnology,18-23 December, 2011, at University of Delhi, India.

  • Novel Non-Chemically Amplified (n-CARs) Resists for Next Generation Lithography (NGL) Applications, Vikram Singh, V. S. V. Satyanarayana, Vishwanath Kalyani,Satinder K. Sharma, Subrata Ghosh, Chullikkattil P. Pradeep and Kenneth E. Gonsalves, "presented, as a poster presentation at ICON-2014,Theme 06: Nanolithography / Microfluids:- Abstract No.:- 17 ; Poster ID:- P-12 (T-6)., on March 3-5, 2014 at Chandigarh, India.(Received the best poster award sponsored by RSC).

  • Novel non-Chemical Amplified (n-CARs) Negative Resists for EUVL, Vikram Singh, V. S. V. Satyanarayana,Satinder K. Sharma, Subrata Ghosh, Kenneth E. Gonsalves, presented, as a oral presentation at SPIE Advanced Lithography Symposium-2014, Advances in Patterning Materials and Processes XXXI, SPIE paper no, 9051-5, 2014.

  • Organic-Inorganic Hybrid Resists for EUVL, Vikram Singh, Vishwanath Kalyani, V. S. V. Satynarayana, Pradeep Parameswaran, Subrata Ghosh,Satinder K. Sharma, Kenneth E. Gonsalves, presented, as a poster presentation at SPIE Advanced Lithography Symposium-2014, Advances in Patterning Materials and Processes XXXI, SPIE paper no, 9051-71, 2014.

  • Design and synthesis of novel resist materials for EUVL, presented, V. S. V. Satyanarayana, Vikram Singh, Subrata Ghosh,Satinder Sharma, Kenneth E. Gonsalves, "as a poster presentation at SPIE Advanced Lithography Symposium-2014, Extreme Ultaviolet (EUV) Lithography V, SPIE paper no, 9048-67, 2014.

  • Optimization of processing parameters and metrology for novel NCA negative resist for NGL, Vikram Singh, V. S. V. Satyanarayana, Felipe Kessler, Francine R. Scheffer, Daniel E. Weibel, Satinder K. Sharma , Subrata Ghosh, Kenneth E. Gonsalves, presented, as a poster presentation at SPIE Advanced Lithography Symposium-2014, Extreme Ultaviolet (EUV) Lithography V, SPIE paper no, 9048-69, 2014.

  • DAC Successive Approximation ADC Using Clocked Current Mirror, Ashish Joshi,Satinder Sharma , Sanjeev Manhas and S. Dasgupta, International Conference on Advances in Electronics Engineering, Feb: 19-20, Singapore, 2014.

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