Dr. Satinder Kumar Sharma

Dr. Satinder Kumar Sharma
Designation: Associate Professor

School of Computing & Electrical Engineering (SCEE)

Room-201, First Floor, A-4 Building,

Indian Institute of Technology (IIT) Mandi

South Campus, Mandi, H.P., India-175075
E-Mail: satinder@iitmandi.ac.in
Office Phone: 01905-267841
Research Group: Device Engineering Lab (DEL) Group

Additional Responsibility: Co-ordinator

Center for Design & Fabrication of Electronic Devices (C4DFED)

Room No. 102, Basement, A4-Building,

Indian Institute of Technology (IIT) Mandi

South Campus, Mandi, H.P., India-175075
Center E-Mail: c4dfed@iitmandi.ac.in
Website: http://faculty.iitmandi.ac.in/~satinder/
Center Website: https://c4dfed.com/
ORCiD: 0000-0001-9313-5550
Web of Science: B-4006-2013
Research Gate: https://www.researchgate.net/profile/Satinder_Sharma

Research Interests


  • VLSI Technology

  • CMOS Device Fabrication & Characterization
  • CMOS Memories, FETs and Logic Devices

  • Advanced Next Generation Lithography
  • Nano/Micro Fabrication & Design

  • MEMS,NEMS, Sensors
  • Optoelectronic, Photovoltaic & Self-assembly

  • Microelectronics Circuits & System

List of Patents


  1. Metal-organic Clusters (MOCs) Resist for Sub 10 nm Semiconductor Technology Node Patterning by Helium Ion Beam (He + BL), and Electron Beam Lithography (EBL)

    Inventors: Rudra Kumar, Manvendra Chauhan, M. G. Moinuddin, Satinder K. Sharma, Kenneth E. Gonsalves; (Application number: 202011003482).

  2. Reconfigurable Reduced Switching Activity (Rsw) Mode For An Analog-To-Digital Converter

    Inventors: Ashish Shirish Joshi, Hitesh Shrimali, Satinder K. Sharma (Application number: 201911042977).

  3. A New Class of Non-Chemically Amplified Molecular Photoresists for Next Generation Integrated Circuits (ICs) Technology

    Inventors: Kenneth E Gonsalves; Subrata Ghosh; Pradeep Parameswaran; Satinder K. Sharma; Neha Thakur; Pulikanti Guru Prasad Reddy; Santu Nandi; Midathala Yogesh; (Application number: 201611044190).

  4. A One Step, Low Temperature, Cost Effective, Photo-Chemical Reduction of Graphene Oxide Dispersions for the Commercial Scale Analogous reduced graphene oxide (r-GO) Production

    Inventors: Satinder K. Sharma, M. Soni, P. Kumar, A.Soni. (Application Number:- 201611028125).

  5. Resist Technology Based on Polyarylene sulphide. (PAS) as a Unique Polymer Material for Semiconductor Fabrication Technology

    Inventors: K. E. Gonsalves, S. Ghosh, C. P. Pradeep, P. G. Reddy, S. K. Sharma, S. P. Pal (Application number: IN 2016-11018061)

  6. Poly alkyl sulfide (PAS) synthesis, charecterization and its UV-365 nm lithography patterning

    Inventors: Kenneth E. Gonsalves, Satinder K. Sharma, Subrata Ghosh, Chullikkattil P. Pradeep, Pulikanti Guruprasad Reddy, Satyendra P. Pal, Pawan Kumar.

  7. Highly Sensitive MAPDSM-MAPDST based Resists Technology for Next Generation Lithography

    Inventors: Kenneth E. Gonsalves, Satinder K. Sharma, Subrata Ghosh, Chullikkattil P. Pradeep, Pulikanti Guruprasad Reddy, Satyendra P. Pal, Pawan Kumar. (Application number: 201611022219A).

List of Published International Journals


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    2021

  1. Maskless lithography: an approach to SU-8 based sensitive and high-g Z-axis polymer MEMS accelerometer

    Mandeep Jangra, Dhairya Singh Arya, Robin Khosla,Satinder K. Sharma.
    Microsystem Technologies (2021)
    doi.org/10.1007/s00542-021-05217-0(0123456789)

  2. Substrate Orientation Dependent Current Transport Mechanisms in -Ga2O3/Si based Schottky Barrier Diodes

    Manoj K Yadav, Arnab Mondal, Ankush Bag, Satinder K. Sharma.
    Journal of Vacuum Science & Technology A 39, 033203 (2021)
    doi:10.1116/6.0000858

  3. Development of Metal-Organic Cluster based Negative Tone Resist: Pre-screened through the Helium-ion Beam prelude to Extreme Ultraviolet Lithography (EUVL) Applications

    Satinder K. Sharma, Manvendra Chauhan, Rudra Kumar, Kumar Palit, Sumit Choudhary, and Kenneth E. Gonsalves.
    Advances in Patterning Materials and Processes XXXVIII Vol. 11612, 1161208 (2021)
    doi: 10.1117/12.2583850 Link to the Presentation

  4. (Just Accepted)
    Digitally Assisted Secondary Switch-and-Compare Technique for a SAR ADC

    Ashish Joshi, Hitesh Shrimali, Satinder K. Sharma.
    IEEE Transactions on Circuits and Systems II, Pages 1549-7747, I.P <2.5 (2021),
    10.1109/TCSII.2021.3053210

  5. (Just Accepted)
    Integration of high-performance cost-effective copper-metal-organic-nanoclusters based gate dielectric for next-generation CMOS applications

    Prachi Gupta, Rudra Kumar, Satinder K. Sharma.
    Advanced Electronic Materials (2021)

  6. 2020

  7. Resists for Helium Ion Beam Lithography: Recent Advances

    Nagarjuna Ravi Kiran, Manvendra Chauhan, Subrata Ghosh, Satinder K. Sharma and Kenneth E. Gonsalves.
    ACS Applied Electronic Materials (2020);

  8. A Discrete-Time MOS Parametric Amplifier-Based Chopped Signal Demodulator

    Ashish Joshi, Hitesh Shrimali, Satinder K. Sharma;
    , IEEE Transactions on Very Large Scale Integration (VLSI) System (2020);
    10.1049/iet-cds.2019.0224

  9. NrGO Floating Gate and Ultra thin SiOXNY Tunneling layer based Al/PMMA/ NrGO/SiOXNY/p-Si/Au gate stack for Reliability Analysis of Flash Memory

    Mahesh Soni, Ajay Soni, and Satinder K. Sharma;
    IEEE Transactions on Device and Materials Reliability (2020);
    10.1109/TDMR.2020.3010267

  10. Functionalized Ag Nanoparticles Embedded in Polymer Resists for High-Resolution Lithography

    Mohamad G. Moinuddin, Rudra Kumar, Midathala Yogesh, Shivani Sharma, Manoj Sahani, Satinder K. Sharma and Kenneth E. Gonsalves.
    ACS Applied Nano Materials (2020);
    10.1109/TDMR.2020.3010267

  11. Reduceded switching mode for an SAR ADC: analysis and design of an SAR A-to-D algorithm with periodic standby mode circuit components

    Ashish Joshi, Hitesh Shrimali, Satinder K. Sharma;
    IET Circuits, Devices & Systems, (2020);
    10.1049/iet-cds.2019.0224

  12. Focusing on nanoparticles based photomultiplier in n-CARs

    Satinder K. Sharma, Mohamad G. Moinuddin, Midathala Yogesh, Shivani Sharma, Manoj Sahani, Subrata Ghosh, and Kenneth E. Gonsalves;
    Proceedings Volume 11326, Advances in Patterning Materials and Processes XXXVII; 113261C, (2020);
    10.1117/12.2552190

  13. All new nickel based Metal Core Organic Cluster (MCOC) resist for N7+ node patterning

    Satinder K. Sharma, Rudra Kumar, Manvendra Chauhan, Mohamad G. Moinuddin, Jerome Peter, Subrata Ghosh, Chullikkattil P. Pradeep, and Kenneth E. Gonsalves;
    Proceedings Volume 11326, Advances in Patterning Materials and Processes XXXVII; 1132604, (2020);
    10.1117/12.2552189

  14. Highly sensitive electrochemical sensing of neurotransmitter dopamine from scalable UV irradiation-based nitrogen-doped reduced graphene oxide-modified electrode

    Richa Soni, Kumar Palit, Mahesh Soni, Rudra Kumar and Satinder K. Sharma;
    Bulletin of Materials Science, (2020);
    10.1007/s12034-020-02091-w

  15. Mechanistic Insights of Sn-Based Non-Chemically-Amplified Resists under EUV Irradiation

    Guilherme K. Belmonte, Suelen W. Cendron, Pulikanti Guruprasad Reddy, Cleverson A.S. Moura, Mohamad Ghulam Moinuddin, Jerome Peter, Satinder K. Sharma, Gabriela Lando, Marcelo Puiatti, Kenneth E. Gonsalves, Daniel E.Weibel;
    Applied Surface Science, (2020);
    10.1016/j.apsusc.2020.146553

  16. Development of Nickel-Based Negative Tone Metal Oxide Cluster Resists for Sub-10 nm Electron Beam and Helium Ion Beam Lithography

    Rudra Kumar, Manvendra Chauhan, Mohamad G. Moinuddin, Satinder K. Sharma, and Kenneth E. Gonsalves;
    ACS Applied Materials & Interfaces, (2020);
    10.1021/acsami.9b21414

  17. Organotin in Nonchemically Amplified Polymeric Hybrid Resist Imparts Better Resolution with Sensitivity for Next-Generation Lithography

    Jerome Peter, Mohamad G. Moinuddin, Subrata Ghosh, Satinder K. Sharma, and Kenneth E. Gonsalves;
    ACS Applied Polymer Materials, (2020);
    10.1021/acsapm.0c00005

  18. 2019

  19. Room temperature ammonia gas sensor using Meta Toluic acid functionalized graphene oxide

    Ravi Kumar, Anil Kumar, Rakesh Singh, Rajesh kashyap, Rajiv Kumar, Dinesh Kumar, Satinder K. Sharma, Mukesh Kumar,
    Materials Chemistry and Physics 240, 121922, (2019);
    10.1016/j.matchemphys.2019.121922

  20. Low-Current-Density Magnetic Tunnel Junctions for STT-RAM Application Using MgOxN1?x (x = 0.57) Tunnel Barrier

    M. G. Moinuddin, Aijaz. H. Lone, Shivangi Shringi, Srikant Srinivasan and Satinder K Sharma,
    IEEE Transactions on Electron Devices, (2019);
    10.1109/TED.2019.2954131

  21. Alternate lanthanum oxide/silicon oxynitride-based gate stack performance enhancement due to ultrathin oxynitride interfacial layer for CMOS applications

    Prachi Gupta, Mahesh Soni, Satinder K. Sharma;
    Journal of Materials Science: Materials in Electronics,vol 31, pp-1986-1995, Dec (2019);
    10.1007/s10854-019-02718-7

  22. Impact of annealing temperature on band-alignment of PLD grown Ga2O3/Si (100) heterointerface

    Manoj K. Yadav, Arnab Mondal, Subhashis Das, Satinder K. Sharma, Ankush Bag,
    Journal of Alloys and Compounds; 153052, 16 November (2019);
    10.1016/j.jallcom.2019.153052

  23. Realization of large area Co20Fe60B20 based p-magnetic tunnel junction for CMOS compatible device application

    Mohamad G. Moinuddin, Aijaz Lone, Srikant Srinivasan, and Satinder K. Sharma,
    ACS Applied Electronic Materials, (2019);
    10.1021/acsaelm.9b00469

  24. Realization and Performance Analysis of Facile Processed -IDE based multi-layer HfS2/HfO2 Transistors

    Shivani Sharma, Subhashis Das, Robin Khosla, Hitesh Shrimali, Satinder K. Sharma;
    IEEE Transaction on Electron Devices, Volume: 66, Issue: 7, July (2019);
    10.1109/TED.2019.2917323

  25. Facile Synthesis of 2D-HfS2 Flakes/?-IDE based Highly Sensitive and Selective Sensor for Methanol Sensing Application at Room Temperature

    Subhashis Das, Shivani Sharma and Satinder K. Sharma;
    IEEE Sensors Journal, 26 June (2019);
    10.1109/JSEN.2019.2925027

  26. Low Voltage & Controlled Switching of MoS2-GO Resistive Layers based ReRAM for Non-Volatile Memory Applications

    Sumit Choudhary, Mahesh Soni, and Satinder K. Sharma;
    Semicond. Sci. Technol.34, 085009, 11pp, (2019);
    10.1088/1361-6641/ab2c09

  27. Highly UV sensitive Sn Nanoparticles blended with polyaniline onto Micro-Interdigitated Electrode Array for UV-C detection applications

    Shivani Sharma, Subhashis Das, Robin Khosla, Hitesh Shrimali, and Satinder K. Sharma;
    Journal of Materials Science: Materials in Electronics; Vol. 30, Issue 8, pp 7534-7542, (2019);
    10.1007/s10854-019-01067-9

  28. 2018

  29. Ferrocene Bearing Non-ionic Poly-aryl Tosylates: Synthesis, Characterization and Electron Beam Lithography Applications

    Pulikanti Guruprasad Reddy, M. G. Moinuddin, Aneesh M. Joseph,Santu Nandi,Midathala Yogesh,Subrata Ghosh,Chullikkattil P. Pradeep , Satinder K. Sharma, Kenneth E. Gonsalves;
    Journal of Photopolymer Science and Technology, Volume 31, Number 6, pp-669-678, (2018);
    10.2494/photopolymer.31.669

  30. Evaluation of high-resolution and sensitivity of n-CAR hybrid resist for sub-16nm or below technology node

    Satinder K. Sharma, Mohamad Ghulam Moinuddin, Pulikanti Guruprasad Reddy, Chullikkattil P. Pradeep, Subrata Ghosh, and Kenneth E. Gonsalves;
    Proc. SPIE 10583, Extreme Ultraviolet (EUV) Lithography IX, 105831Q, SPIE Advanced Lithography, (2018);
    10.1117/12.2297565

  31. Integration of graphene oxide buffer layer/graphene floating gate for wide memory window in Pt/Ti/Al2O3/GO/graphene/SiO2/p-Si/Au non-volatile (FLASH) applications

    Mahesh Soni, Ajay Soni, and Satinder K. Sharma,
    Applied Physics Letters, 112, 252102, (2018);
    10.1063/1.5030020

  32. Helium ion active hybrid non-chemically amplified resist (n-CAR) for sub-10 nm patterning applications

    Satinder K. Sharma, Pulikanti Guruprasad Reddy, Mohamad Ghulam Moinuddin, Subrata Ghosh, Chullikkattil P. Pradeep, and Kenneth E. Gonsalves;
    Proc. SPIE 10584, Emerging Patterning Technologies, 1058409, SPIE Advanced Lithography, (2018);
    10.1117/12.2297537

  33. High-Performance CSA-PANI based Organic Phototransistor by Elastomer Gratings

    Shivani Sharma, Robin Khosla, Subhashis Das, Hitesh Shrimali, and Satinder K. Sharma;
    Journal of Organic Electronics, vol 57; pp-14-20, (2018);
    10.1016/j.orgel.2018.02.031

  34. Investigations on structural, optical and magnetic properties of Fe and Dy co-doped ZnO nanoparticles

    Jaskaran Singh; Arun Kumar Singh; Robin Khosla; Satinder K. Sharma; Gyaneshwar Sharma; Sanjeev Kumar;
    Journal of Materials Science: Materials in Electronics, vol 29, pp-850-385, (2018);
    10.1007/s10854-017-8321-4

  35. Scalable and site specific functionalization of reduced graphene oxide for circuit elements and flexible electronics

    Mahesh Soni, Pawan Kumar, Juhi Pandey, Satinder K. Sharma, Ajay Soni;
    Carbon; Vol. 128, Pages 172-178, (2018);
    10.1016/j.carbon.2017.11.087

  36. Frequency Dispersion and Efficient Capacitance Correction Method in High-? MOS Capacitors based on C-V and C-F Measurements

    Robin Khosla and Satinder K. Sharma;
    Journal of Vacuum Science & Technology-B (JVST-B); vol 36, 012201, (2018);
    10.1116/1.4995809

  37. Enhanced nano-mechanical properties of the high resolution EUVL patterns of MAPDSA-MAPDST resists containing hexafluoro antimonate

    Pawan Kumar, Pulikanti Guru Prasad Reddy, Satinder K. Sharma, Subrata Ghosh, Chullikkattil P. Pradeep and Kenneth E. Gonsalves;
    Journal of Microelectronics Engineering, (2018);
    10.1016/j.mee.2018.03.014

  38. 2017

  39. Design of a Charge Sensitive Amplifier for Particle Detection Application in BCD 180 nm Technology

    H.Shrimali, A.Joshi, E. Ruscino, I. Yadav, Satinder K. Sharma, V. Liberali, and A. Andreazza;
    Journal of Instrumentation; JINST_018P_0917; September 7, (2017).

  40. New non-chemically amplified molecular resist design with switchable sensitivity for multi-lithography applications and nanopatterning

    Neha Thakur; Pulikanti Reddy, Nandi Santu, Yogesh, Midathala; Satinder K. Sharma, Chullikkattil Pradeep, Subrata Ghosh, Kenneth Gonsalves,
    Journal of Micromechanics and Microengineering, IOP Science, (2017);
    10.1088/1361-6439/aa8751

  41. Organic-Inorganic Hybrid Photoresists Containing Hexafluoroantimonate: Design, Synthesis and High Resolution EUV Lithography Studies

    Pulikanti Guruprasad Reddy, Pawan Kumar, Subrata Ghosh, Chullikkattil P. Pradeep, Satinder K. Sharma, and Kenneth E. Gonsalves;
    Materials Chemistry Frontiers, (2017);
    10.1039/c7qm00343a

  42. Nitrogen Doped Multilayer Photo Catalytically Reduced Graphene Oxide Floating Gate: Al/PMMA/NrGO/SiO2/p-Si/Au based Hybrid Gate Stack for Non Volatile Memory Applications

    Mahesh Soni, Ajay Soni, Satinder K. Sharma;
    Journal of Organic Electronics, vol 51, (2017);
    10.1016/j.orgel.2017.09.011

  43. Photoacid generator integrated terpolymer for electron beam lithography applications: sensitive resist with pattern transfer potential

    Santu Nandi, Midathala Yogesh, P. Guru Prasad Reddy, Satinder K. Sharma, Chullikkattil P. Pradeep, Subrata Ghosh and Kenneth E Gonsalves;
    Mater.Chem.Front., vol 1, pp-1895-1899, (2017);
    10.1039/C7QM00140A

  44. Highly-Sensitive Surface-Enhanced Raman Scattering (SERS) based Multi Gas Sensor: Au nanoparticles decorated on partially embedded 2D colloidal crystals into elastome

    Satinder K. Sharma, Pawan Kumar, Sumit Barthwal, Seema Sharma and Ashutosh Sharma,
    Chemistry Select, vol 2, pp-6961-6969, (2017);
    10.1002/slct.201701204

  45. Fluorine-Chlorine co-doped TiO2/CSA doped Polyaniline based high performance inorganic/organic hybrid heterostructure for UV photodetection applications

    Shivani Sharma, Robin Khosla, Dinesh Deva, Hitesh Shrimali and Satinder K. Sharma;
    Sensors and Actuators A Physical, 261, April (2017);
    10.1016/j.sna.2017.04.043

  46. Photo-Catalytic Reduction of Oxygenated Graphene Dispersions for Supercapacitor Applications

    Mahesh Soni, Pawan Kumar, Rudra Kumar, Satinder K. Sharma and Ajay Soni;
    Journal of Physics. D: Appl. Phys.,vol 50, 124003, 8pp, (2017);
    10.1088/1361-6463/aa5c9f

  47. Polyarylenesulfonium salt as a novel and versatile non-chemically amplified negative tone photoresist for high resolution EUV lithography applications

    Pulikanti Guruprasad Reddy, Satyendra Prakash Pal, Pawan Kumar, Chullikkattil P. Pradeep, Subrata Ghosh, Satinder K. Sharma, Kenneth E. Gonsalves;
    ACS Appl. Mater. Interfaces, vol 9 (1), pp 17-21, (2017);
    10.1021/acsami.6b10384

  48. A Systematic Design Approach for a Gain Boosted Telescopic OTA with Cross Coupled Capacitor

    Ashish Joshi, Hitesh Shrimali and Satinder K. Sharma;
    IET Circuits, Devices & Systems, Vol. 11 Iss. 3, pp. 225-231, (2017).
    10.1049/iet-cds.2016.0448

  49. Selective detection of F? using Al microarrays integrated graphene oxide

    M. Soni, P. Kumar, A. Soni, Satinder K. Sharma;
    Sensors and Actuators B: Chemical, Volume 247, Pages 224-227, (2017);
    10.1016/j.snb.2017.02.142

  50. A highly sensitive, flexible SERS sensor for malachite green detection based on Ag decorated microstructured PDMS substrate fabricated from Taro leaf as template

    Pawan Kumar, Robin Khosla, Mahesh Soni, Dinesh Deva and Satinder K. Sharma;
    Sensor and Actuators B: Chemical, Volume 246, Pages 477-486, (2017);
    10.1016/j.snb.2017.01.202

  51. Charge Trapping Analysis of Metal/Al2O3/SiO2/Si, gate stack for emerging embedded memories

    Robin Khosla, Erlend Rolseth, Pawan Kumar, Senthil Srinivasan V Palayam, Satinder K. Sharma and J�rg Schulze;
    IEEE Transactions on Device and Materials Reliability, Volume: 17, Issue: 1, March (2017);
    10.1109/TDMR.2017.2659760

  52. 2016

  53. Design and Development of Low Activation Energy based Non Chemically Amplified (n-CARs) Resists for Next Generation EUV Lithography

    Satinder K. Sharma, Satyendra Prakash Pal, Pulikanti Guruprasad Reddy, Pawan Kumar, Subrata Ghosh and Kenneth E. Gonsalves,
    Microelectronic Engineering, vol 164, pp-115-122, (2016);
    10.1016/j.mee.2016.07.017

  54. Recent advances in non-chemically amplified photoresists for next generation IC technology

    Subrata Ghosh, Chullikkattil P. Pradeep, Satinder K. Sharma, Pulikanti Guruprasad Reddy, Satyendra P. Pal and Kenneth E. Gonsalves;
    RSC Adv., vol 6, pp-74462-74481, (2016), Impact factor 3.3;
    10.1039/C6RA12077F

  55. Surface Potential Investigations of Post Deposition Annealed Er2O3 films by Kelvin Probe Force Microscopy for Scaled Memory Device Applications

    Pawan Kumar, Robin Khosla, Satinder K. Sharma;
    Surface and Interfaces, vol 4, pp-69-76, (2016);
    10.1016/j.surfin.2016.08.003

  56. Design, development and nano mechanical investigations of a new organic monomer and HfO2 nano-particles based hybrid resist for EUVL applications

    Pulikanti Guruprasad Reddy, Narsimha Mamidi, Pawan Kumar, Satinder K. Sharma, Subrata Ghosh, Kenneth E. Gonsalves, Chullikkattil P. Pradeep;
    RSC Adv., vol 6, pp-67143-67149, (2016), Impact factor 3.3;
    10.1039/C6RA10575K

  57. Patterning highly ordered arrays of complex nanofeatures through EUV directed polarity switching of non-chemically amplified photoresist

    Subrata Ghosh, V. S. V. Satyanarayana, Bulti Pramanick, Satinder K. Sharma, Chullikkattil P. Pradeep, Israel Morales-Reyes, Nikola Batina, Kenneth E. Gonsalves;
    Nature, Scientific Reports, vol 6, pp-22664, (2016);
    10.1038/srep22664

  58. Integration of Highly Sensitive Oxygenated Graphene with Aluminum Micro-Interdigitated Electrode Array Based Molecular Sensor for Detection of Aqueous Fluoride Anions

    Mahesh Soni, Tarun Arora, Robin Khosla, Pawan Kumar, Ajay Soni, Satinder K. Sharma,
    IEEE Sensors Journal, VOL. 16, NO. 6, MARCH 15, (2016), I.P>3.0;
    10.1109/JSEN.2015.2505782

  59. 2015

  60. Charge Trapping and Decay Mechanism in Post Deposition Annealed Er2O3 MOS Capacitors by Nanoscopic and Macroscopic Characterization

    Robin Khosla, Pawan Kumar and Satinder K. Sharma;
    IEEE Transactions On Device and Materials Reliability, Vol. 15, No. 4, December (2015), Impact factor 1.9;
    10.1109/TDMR.2015.2498310

  61. Dual Gate Tunable and High Responsivity Graphene-Based Field Effect Transistors

    Mahesh Soni, Satinder Kumar Sharma, Ajay Soni;
    Macromol. Symp. Soft Materials, 357, pp-12-17, (2015);
    10.1002/masy.201400176

  62. Multilevel Metal-Pb (Zr0.52 Ti0. 48) O3-TiOxNy-Si for Next Generation FeRAM Technology Node

    Deepak K. Sharma, Robin Khosla and Satinder K. Sharma;
    Solid-State Electronics, vol 5, (2015), Impact factor 1.58;
    10.1016/j.sse.2015.04.006

  63. An 8 bit, 100 kS/s, Switch-Capacitor DAC SAR ADC for RFID applications

    Ashish Joshi, Sanjeev Manhas, Satinder K. Sharma and S. Dasgupta;
    Microelectronics Journal, vol 46, pp-453-461, (2015), Impact factor 0.92;
    10.1016/j.mejo.2015.03.009

  64. New Polyoxometalates Containing Hybrid Polymers and Their Potential for Nano-patterning

    Vishwanath Kalyani, V. S. V. Satyanarayana,Vikram Singh,Chullikkattil P. Pradeep, Subrata Ghosh, Satinder K. Sharma, Kenneth E. Gonsalves;
    Chemistry A Chem. Eur. J., vol 21, pp-2250-2258, (2015), Impact Factor: 5.7;
    10.1002/chem.201405369

  65. 2014

  66. Effect of electrical stress on Au/Pb (Zr0.52Ti0.48) O3/TiOxNy/Si gate stack for reliability analysis of ferroelectric field effect transistors

    Robin Khosla, Deepak K. Sharma, Kunal Mondal and Satinder K. Sharma;
    Applied Physics Letters, vol 105, (2014), I.P> 3.59;
    10.1063/1.4897952

  67. Templated Electrochemical Synthesis of Polyaniline/ZnO Coaxial Nanowires with Enhanced Photoluminescence

    Neelam Saurakhiya, Satinder K. Sharma, Rudra Kumar, and Ashutosh Sharma;
    Industrial & Engineering Chemistry Research (I & EC, Research), vol 27, (2014), I.P>2.25;
    10.1021/ie500989m

  68. Performance evaluation of nonchemically amplified negative tone photoresists for e-beam and EUV lithography

    Vikram Singh, V.S.V.Satyanarayana, Nikola Batina, Israel Morales Reyes, Satinder K. Sharma, Felipe Kessler, Francine R. Scheffer, Daniel E. Weibel, Subrata Ghosh and Kenneth E. Gonsalves; J. Micro/Nanolith.
    MEMS MOEMS, Society of Photo-Optical Instrumentation Engineers (SPIE), (2014), Impact factor: 1.20;
    10.1117/1.JMM.13.4.04300210

  69. A hybrid polymeric material bearing a ferrocene based pendant organometallic functionality: synthesis and applications in nano patterning using EUV lithography

    V. S. V. Satyanarayana, Vikram Singh, Vishwanath Kalyani, Chullikkattil P. Pradeep, Satinder Sharma, Subrata Ghosh and Kenneth E. Gonsalves;
    RSC Advances Journal, RSC Adv., Vol 4, PP-59817, (2014), Impact factor: 3.7;
    10.1039/c4ra10648b

  70. Design and synthesis of novel resist materials for EUVL

    V. S. V. Satyanarayana, Vikram Singh, Subrata Ghosh, Satinder Sharma, Kenneth E. Gonsalves;
    Proc. of SPIE Vol. 9048, 90481W, CCC code:0277-786X/14/$18, (2014);
    10.1117/12.2045736

  71. Tuning of structural, optical, and magnetic properties of ultrathin and thin ZnO nanowire arrays for nano device applications

    Satinder K. Sharma, Neelam Saurakhiya, Sumit Barthwal, Rudra Kumar and Ashutosh Sharma;
    Nanoscale Research Letters, vol 9:122, (2014), I.P> 3.55;
    10.1186/1556-276X-9-122

  72. Organic-Inorganic Hybrid Resists for EUVL

    Vikram Singh, Vishwanath Kalyani, V. S. V. Satynarayana, Pradeep Parameswaran, Subrata Ghosh, Satinder K. Sharma, Kenneth E. Gonsalves;
    Proc. of SPIE Vol. 9051, 90511W,SPIE CCC code: 0277-786X/14/$18, (2014);
    10.1117/12.2041907

  73. A Switch-Capacitor DAC Successive Approximation ADC Using Regulated Clocked Current Mirror

    Ashish Joshi, Satinder Sharma, Sanjeev Manhas and S. Dasgupta;
    International Journal of Electronics and Electrical Engineering (IJEEE), Vol.2, No.1, (2014);
    10.12720/ijeee.2.1.50-55

  74. Novel non-Chemical Amplified (n-CARs) Negative Resists for EUVL

    Vikram Singh, V. S. V. Satyanarayana, Satinder K. Sharma, Subrata Ghosh, Kenneth E. Gonsalves;
    Advances in Patterning Materials and Processes Proc. of SPIE Vol. 9051, 905106, SPIE CCC code: 0277-786X/14/$18, (2014);
    10.1117/12.2041183

  75. Towards Novel non-Chemically Amplified (n-CARS) Negative Resists for Electron Beam Lithography Applications

    Vikram Singh, V. S. V. Satyanarayana, Satinder K. Sharma, Subrata Ghosh, Kenneth E. Gonsalves;
    J. Mater. Chem. C, vol 2, pp-2118-2122, (2014), Impact factor 6.2;
    10.1039/c3tc31826e

  76. Optimization of processing parameters and metrology for novel NCA negative resist for NGL

    Vikram Singh, V. S. V. Satyanarayana, Felipe Kessler, Francine R. Scheffer, Daniel E. Weibel, Satinder K. Sharma, Subrata Ghosh, Kenneth E. Gonsalves;
    Proc. of SPIE Vol. 9048, 90481Y, SPIE CCC code: 0277-786X/14/$18, (2014). DOI:
    10.1117/12.2045882

  77. 2013-2012

  78. PZT-PDMS composite for active damping of vibrations

    Satinder K. Sharma, Himani Gaur, Manish Kulkarni, Ganesh Patil, Bishakh Bhattacharya, Ashutosh Sharma;
    Composites Science and Technology, vol 77, pp-42-51, (2013), Impact factor 3.9;
    10.1016/j.compscitech.2013.01.004

  79. PECVD based silicon oxynitride thin ?lms for nano photonic on chip interconnects applications

    Satinder K. Sharma, Sumit Barthwal, Vikram Singh, Anuj Kumar, Prabhat K. Dwivedi, B. Prasad, Dinesh Kumar;
    Micron, vol 44, pp-339-346, (2013), Impact factor 2.1;
    10.1016/j.micron.2012.08.006

  80. Antimicrobial Properties of Electro-ChemicallyStabilized Organo-Metallic Thin

    Kumud Kant Awasthi, Anjali Awasthi, Kamakshi, Narain Bhoot, P. J.John, Satinder K. Sharma, and Kamlendra Awasthi;
    Advanced Electrochemistry, vol 6, pp-1-6, (2013), Impact factor 1.2;
    10.1166/adel.2013.1013

  81. Chalcogenide Glass Photoresists for Grayscale Patterning

    Prabhat K. Dwivedi, Amritha Rammohan,Satinder K. Sharma, Ashutosh Sharma;
    AIP Conference Proceedings Vol.1349, 555 (2011);, Impact factor 1.8;
    10.1063/1.3605979

  82. DOI: 10.1063/1.3605979

    2011

  83. Surface disordering and its correlations with properties in argon implanted CR-39 polymer

    Nidhi Shekhawat, Sanjeev Aggarwal,Annu Sharma, Satinder K. Sharma, S. K. Deshpande, and K. G. M. Nair;
    Journal of Applied Physics, vol 109, pp-083513, (2011), I.P>2.8;
    10.1063/1.3573480

  84. Study of Rapid Thermal Annealing on Ultra Thin High-K HfO2 Films Properties for nano Scaled MOSFET Technology

    Vikram Singh, Satinder K.Sharma, Dinesh Kumar , R.K. Nahar;
    Microelectronics Engineering B, (2011), Impact factor 1.7;
    10.1016/j.mee.2011.09.005

  85. Frequency Dependence Studies on the Interface Trap Density and Series Resistance of HfO2 Gate Dielectric Deposited on Si Substrate: Before and After 50MeV Li3+ Ions Irradiation

    Vikram Singh,N.Shashank, Satinder K. Sharma, Dinesh Kumar, R.K. Nahar;
    Nuclear Instruments and Methods in Physics Research B., (2011), Impact factor 1.2;
    10.1016/j.nimb.2011.08.025

  86. Large scale synthesis of polyaniline nanowires and their characterization

    Sanjeev Kumar and Satinder K. Sharma;
    Journal of Materials Science: Materials in Electronics, I.P> 2.2, (2011);
    10.1007/s10854-011-0583-7

  87. 2010

  88. High-k Dielectric Stacks Charge Trapping for CMOS Technology

    Satinder K. Sharma, B.rasad and Dinesh Kumar;
    Material Science and Engineering B, vol 166, pp-170-173, Impact factor 2.7, (2010);
    10.1016/j.mseb.2009.11.002

  89. Templated One Step Electrodeposition of High Aspect Ratio n-type ZnO Nanowire Arrays

    Satinder K. Sharma, Amritha Rammohan and Ashutosh Sharma;
    Journal of Colloidal and Interfacial Science, (2010), Impact factor 3.5;
    10.1016/j.jcis.2009.12.026

  90. Stability and Dewetting of Metal Nanoparticles Filled Thin Polymer Films: Control of Instability Length scale and Dynamics

    Rabibrata Mukherjee,SomaDas,AnindyaDas,Satinder K. Sharma, Arup K. Raychaudhuri and Ashutosh Sharma;
    ACS NANO, Impact factor 10.0, (2010);
    10.1021/nn901912d

  91. Nickel silicide formation by electroless technique for ULSI technology

    Anuj Kumar, Mukesh Kumar, Amanpal Singh, Satinder Kumar, Dinesh Kumar;
    Microelectronic Engineering, vol 87, pp-286-289, (2010), I.P> 2.3;
    10.1016/j.mee.2009.07.021

  92. Changes in Structural and Optical Properties of Polycarbonate Induced by Ag+ Ion Implantation

    Suman Bahniwal, Annu Sharma, Sanjeev Aggarwal, S.K. Deshpande, Satinder K. Sharma, K.G.M.Nair;
    Journal of Macromolecular Science, Part B, vol 49, no. 2, pp-259-268, (2010), Impact factor 1.0;
    10.1080/00222340903352252

  93. Large scale synthesis of cadmium selenide nanowires using template synthesis technique and their Characterization

    Sanjeev Kumara, Vijay Kumar, Satinder K. Sharma, S.K. Sharma, S.K. Chakarvarti;
    Superlattices and Microstructures, pp-1-9, (2010), I.P> 2.0;
    10.1016/j.spmi.2010.03.008

  94. Low-temperature synthesis and characterization of cadmium sulphide nanowires grown using simple chemical reaction through the pores in an alumina template

    Sanjeev Kumar and Satinder K Sharma;
    IOP Publishing Phys. Scr., vol. 82, 000000, 4pp, (2010), Impact factor 1.0;
    10.1088/0031-8949/82/02/025801

  95. 2009-2008

  96. Alteration of Gate Oxides Thickness for SOC Level Integration

    Satinder K. Sharma, B. Prasad, Dinesh Kumar and Rajkumar;
    Materials Science in Semiconductor Processing, vol 12, pp-99, (2009), I.P>3.0;
    10.1016/j.mssp.2009.08.003

  97. Growth and Characterization of Large -Scale Uniform Zinc Sulfide Nanowires by Simple Chemical Reaction Technique

    Sanjeev Kumar, Satinder K. Sharma;
    Superlattices & Microstructures, (2009), I.P>2.0;
    10.1016/j.spmi.2009.08.008

  98. Multiple thickness gate oxides with fluorine implantation for system on chip applications

    Satinder K. Sharma, B. Prasad, Dinesh Kumar, RajKumar;
    Vacuum, vol. 83, pp-1359, (2009), I.P>2.9;
    10.1016/j.vacuum.2009.04.045

  99. Structural and optical characterization of ZnO thin films deposited by sol-gel method

    A.Singh, A. Kumar, N.Suri, S. Kumar, M.Kumar, P.K.Khanna, D.Kumar;
    Journal of Optoelectronics and Advanced Materials (JOM), pp-790-793, (2009), I.P>0.9;

  100. Surface topography and morphology characterization of PIII irradiated silicon surface

    Satinder K. Sharma and Sumit Barthwal;
    Applied Surface Science, 17552, pp-1-6, (2008),I.P>6;
    10.1016/j.apsusc.2008.07.129

  101. (Kindly refresh page if this message is visible: "Requested article is not found in IHub.")

List of Upcoming Journals


  1. Incorporation of organometallic Tin into multi-functionally decorated macromolecular network

    Midathala Yogesh, Mohamad. G. Moinuddin, Lalit D. Khillare, Srinivas Chinthalapalli, Subrata Ghosh, Satinder K. Sharma and Kenneth Gonsalves. communicated to European Polymer Journal.

  2. Low Voltage Operation and High Mobility with Nitrogen Functionalized Reduced Graphene Oxide based Organic Transistors for Flexible Electronic Circuits

    Mahesh Soni, Ajay Soni, Satinder K. Sharma; communicated to IEEE Transaction Nanotechnology.

  3. Self-calibrated and Digitally Assisted Comparator with Supplementary LSB Generation

    Ashish Joshi, Hitesh Shrimali, and Satinder K. Sharma; comminucated in IET Electronics Letters, 2019.

  4. Z-axis MEMS Accelerometers using SU-8, PolySi, Si3N4 and SiC based structural materials

    Mandeep Jangra, Robin Khosla, and Satinder K. Sharma; communicated to IEEE Sensors Journal.

  5. Ferroelectric Materials: An Ultimate Solution for Next Generation Universal Memories

    Robin Khosla and Satinder K. Sharma; communicated to Journal of Materials Research Bulletin.

  6. Highly Sensitive SERS Sensors Based on Ag coated Self Assembled Colloidal Crystals for Detection of Contaminants in Water

    Pawan Kumar, Mahesh Soni, Tarun Arora, Robin Khosla and Satinder K. Sharma; communicated to Advanced Materials Letters.

List of Published International/National Conferences


    2020

    Dr. Satinder Kumar Sharma
  1. Focusing on nanoparticles based photomultiplier in n-CARs

    Satinder K. Sharma, Mohamad G. Moinuddin, Midathala Yogesh, Shivani Sharma, Manoj Sahani, Subrata Ghosh, Kenneth E. Gonsalves;
    Proc. SPIE 11326, Advances in Patterning Materials and Processes XXXVII, 113261C, San Jose, California, USA, 23 March (2020).
    10.1117/12.2552190

  2. All new nickel based Metal Core Organic Cluster (MCOC) resist for N7+ node patterning

    Satinder K. Sharma,Rudra Kumar, Manvendra Chauhan, Mohamad G. Moinuddin, Jerome Peter, Subrata Ghosh, Chullikkattil P. Pradeep, Kenneth E. Gonsalves;
    Proc. SPIE 11326, Advances in Patterning Materials and Processes XXXVII, 1132604, San Jose, California, USA, 26 March (2020).
    10.1117/12.2552189

  3. 2018

  4. The Capacitively Coupled Chopper Stabilized Amplifier with a DTPA based Demodulator

    A. Joshi, H. Shrimali and S. K. Sharma;
    IEEE International Symposium on Circuits and Systems (ISCAS), Florence, pp. 1-5, (2018).
    10.1109/ISCAS.2018.8351188

  5. Electrically Controlled Magnetic Tunnel Junctions for Next Generation Magnetic Non-Volatile Memory Applications

    Moinuddin, M.G. Srinivasan, Srikant, Sharma, Satinder K.;
    International workshop on NANO/MICRO 2D-3D Fabrication, Manufacturing of Electronic - Biomedical Devices & Applications, (IWNEBD-2018), IIT Mandi, 31 Oct. - 2 Nov., (2018).
    ,

  6. Evaluation of High Resolution & Sensitivity of n-CAR Hybrid Resist for Sub-16nm or Below Technology Node

    Satinder K. Sharma, Mohamad Ghulam Moinuddin, Pulikanti Guruprasad Reddy, Chullikkattil P. Pradeep, Subrata Ghosh, and Kenneth E. Gonsalves;
    SPIE Advanced Lithography 2018, on 21 - 25 February 2018 at San Jose, California United States (USA), (2018).
    10.1117/12.2297565

  7. Helium Ion Active Novel Hybrid n-CAR Resist for Sub-10 nm Patterning Applications

    Satinder K. Sharma, Pulikanti Guruprasad Reddy, Mohamad Ghulam Moinuddin, Subrata Ghosh, Chullikkattil P. Pradeep, and Kenneth E. Gonsalves; Symposium: SPIE Advanced Lithography 2018, at San Jose, California United States (USA), 2018. 10.1117/12.2297537

  8. 2017

  9. Photoresist development for sub-22 nm node technology: Polyarylenesulfonium salt as negative tone resist for electron beam lithography

    Mohamad Ghulam Moinuddin, Pulikanti Guruprasad Reddy, Satinder K Sharma , Chullikkattil P. Pradeep, Subrata Ghosh, and Kenneth E. Gonsalves; National Conference on Complex Engineering Systems of National Importance: Current Trends & Future Perspective, INAC-03 2017 Proceedings (554-557) Organised by ISSE - Chandigarh Chapter & Semi-Conductor Laboratory, Department of Space, Indian School of Business, Chandigarh, October 12-13, 2017. (Awarded with best paper presentation 3rd prize)

  10. Impact of Metal Electrodes on MFIS Structure Performance for NextGeneration FeRAM Applications

    Robin Khosla, and Satinder K. Sharma; National Conference on Complex Engineering Systems of National Importance: Current Trends & Future Perspective, Organised by ISSE - Chandigarh Chapter & Semi-Conductor Laboratory, Department of Space, Indian School of Business, Chandigarh, october 12-13, 2017.

  11. Capacitively Coupled Chopper Stabilized Instrumentation Amplifier for a Biomedical Data Acquisition System in 180 nm CMOS

    Ashish Joshi, Hitesh Shrimali and Satinder K Sharma; National Conference on Complex Engineering Systems of National Importance: Current Trends & Future Perspective, Organised by ISSE - Chandigarh Chapter & Semi-Conductor Laboratory, Department of Space, Indian School of Business, Chandigarh, October12-13, 2017.

  12. 2016-2015

  13. The Pole-zero Doublet: a Cascode Operational Amplifier with Cross Coupled Capacitor

    Ashish Joshi, Indu Yadav, Satinder K. Sharma and Hitesh Shrimali; MWSCAS Abu Dhabi 2016; IEEE 59th International Midwest Symposium on Circuits and Systems 16-19 October, Hotel Fairmont Bab Al Bahr, Abu Dhabi, United Arab Emirates, 2016. 10.1109/MWSCAS.2016.7869985

  14. Design and development of low-activation energy based n-CARs for next-generation EUV lithography

    Satinder K. Sharma, Narsimha Mamidi, Rakhi Pramanick, Pawan Kumar, Subrata Ghosh, Chullikkattil P. Pradeep and Kenneth E. Gonsalves; Symposium: SPIE Advanced Lithography 2016, held on 21 - 25 February 2016 at San Jose, California United States (USA), 2016. 10.1016/j.mee.2016.07.017

  15. Highly Sensitive SERS Sensor Based on Ag coated Self Assembled Colloidal Crystals for Detection of Contaminants present in Water

    Pawan Kumar, Mahesh Soni, Tarun Arora, Robin Khosla and Satinder K. Sharma; International Conference on Materials Science & Technology 2016 (A Global platform for high-tech materials) held on 01 -04 March, 2016 at the Conference Centre, University of Delhi, India, 2016.

  16. GO/�-IDEs/p-Si Based Real Time Sensors for F- Detection in Natural Drinking Water

    Mahesh Soni, Tarun Arora, Pawan Kumar, Ajay Soni, Satinder K. Sharma; 1st IEEE International Symposium on Nanoelectronic and Information System (IEEE-iNIS), 21- 23 December 2015, Indore, India, 2015. 10.1109/iNIS.2015.14

  17. 2D Colloidal Crystals based SERS Sensors for NH3 Detection

    Pawan Kumar, Mahesh Soni, Tarun Arora, Satinder K. Sharma; 1st IEEE International Symposium on Nanoelectronic and Information System (IEEE-iNIS), 21- 23 December 2015, Indore India (2015) DOI: 10.1109/iNIS.2015.53 10.1109/iNIS.2015.53

  18. 2014

  19. High performance Au/PZT/TiOxNy/Si MFIS structure for next generation ferroelectric memory applications

    Deepak K. Sharma, Robin Khosla and Satinder K. Sharma; International Conference on Condensed Matter Physics, ICCMP, Himachal Pradesh University-Shimla, 2014. 10.1063/1.4915377

  20. Charge carrier controlling in Dual Gated Graphene Based Field Effect Transistors

    Mahesh Soni, Satinder K. Sharma, Ajay Soni; International Conference on Soft Materials October, 06-10, ICSM 2014 in Jaipur India, 2014.

  21. DAC Successive Approximation ADC Using Clocked Current Mirror

    Ashish Joshi, Satinder Sharma, Sanjeev Manhas and S. Dasgupta; International Conference on Advances in Electronics Engineering, Feb: 19-20, Singapore, 2014. doi: 10.12720/ijeee.2.1.50-55

  22. Optimization of processing parameters and metrology for novel NCA negative resist for NGL

    Vikram Singh, V. S. V. Satyanarayana, Felipe Kessler, Francine R. Scheffer, Daniel E. Weibel, Satinder K. Sharma, Subrata Ghosh, Kenneth E. Gonsalves; SPIE Advanced Lithography Symposium-2014, Extreme Ultaviolet (EUV) Lithography V, SPIE paper no, 9048-69, 2014. 10.1117/12.2045882

  23. Design and synthesis of novel resist materials for EUVL

    V. S. V. Satyanarayana, Vikram Singh, Subrata Ghosh, Satinder Sharma, Kenneth E. Gonsalves; SPIE Advanced Lithography Symposium-2014, Extreme Ultaviolet (EUV) Lithography V, SPIE paper no, 9048-67, 2014. >10.1117/12.2045736

  24. Organic-Inorganic Hybrid Resists for EUVL

    Vikram Singh, Vishwanath Kalyani, V. S. V. Satynarayana, Pradeep Parameswaran, Subrata Ghosh, Satinder K. Sharma, Kenneth E. Gonsalves; SPIE Advanced Lithography Symposium-2014, Advances in Patterning Materials and Processes XXXI, SPIE paper no, 9051-71, 2014. 10.1039/C7QM00343A

  25. Novel non-Chemical Amplified (n-CARs) Negative Resists for EUVL

    Vikram Singh, V. S. V. Satyanarayana, Satinder K. Sharma, Subrata Ghosh, Kenneth E. Gonsalves; SPIE Advanced Lithography Symposium-2014, Advances in Patterning Materials and Processes XXXI, SPIE paper no, 9051-5, 2014. 10.1117/12.2041183

  26. Novel Non-Chemically Amplified (n-CARs) Resists for Next Generation Lithography (NGL) Applications

    Vikram Singh, V. S. V. Satyanarayana, Vishwanath Kalyani, Satinder K. Sharma, Subrata Ghosh, Chullikkattil P. Pradeep and Kenneth E. Gonsalves; ICON-2014, Theme 06: Nanolithography / Microfluids:- Abstract No.:- 17 ; Poster ID:- P-12 (T-6)., at Chandigarh, India, on March 3-5, 2014. (Received the best poster award sponsored by RSC)

  27. 2012-2010

  28. Radial hetrojunction formation of ZnO-Polyaniline coaxial nanowires via electrochemical route

    Neelam Saurakhiya, Satinder Kumar Sharma, Ashutosh Sharma; International Conference on Nanoscience and Technology (ICONSAT - 2012) January 20 to 23, at Hyderabad, India, 2012.

  29. Ultrathin HfO2 based CMOS for space application

    Vikram Singh, Satinder K. Sharma, R.K. Nahar , Dinesh Kumar; International conference on nano materials and Nanotechnology,18-23 December, at University of Delhi, India, 2011.

  30. Effects of Post-Deposition Annealing on the Material and Electrical Characteristics of Sputtered Ultrathin HfO2 Film on Silicon

    Vikram Singh, Satinder K. Sharma, R.K. Nahar , Dinesh Kumar; 16th International Workshop on The Physics of Semi Conductor Devices, at Indian Institute of Technology-Kanpur, India, 2011.

  31. Chalcogenide Glass Photoresists for Grayscale Patterning

    Prabhat K. Dwivedi, Satinder K. Sharma, Amritha Rammohan and Ashutosh Sharma; 55th DAE Solid State Physics Symposium, India, 2010.

  32. Polyaniline 1D Nanostructures film formation by electrochemical deposition for Biomedical Applications

    Neelam Saurakhiya, Satinder K. Sharma and Ashutosh Sharma; International Conference on Nano Science and Technology(ICONSAT), held at IIT Bombay, Mumbai, India, 17-20,February, 2010.

  33. 2009-2007

  34. Templated electrodeposition of ZnO nanowires array for bio sensing application

    Satinder K. Sharma, Amritha Rammohan and Ashutosh Sharma; Golden Jublilee Symposium on fabrication at small scale and INDO-US conference on fabrionics, organized by IIT -Kanpur, U.P. India, 9-12 December, 2009.

  35. Synthesis and Characterisation of Erbium Nano Particle doped High k Dielectric Thin film for Novel device Applications

    Vikram Singh, Satinder Kumar, Dinesh Kumar, R.K. Nahar; XI international conference on advanced materials (ICAM-09) at Rio de Janeiro Brazil, Sept 2009.

  36. Raman study on NiSi formation by Electroless for ULSI technology

    Anuj Kumar, Mukesh Kumar, Amanpal Singh, Satinder Kumar, B. Parsad and D. Kumar; Ist Rashtreeya Yuva Vaigyanik Sammelan organized by National Institute of Technology, Kurukshetra, Haryana, India, 28-30 November, 2008.

  37. The evolution of phase transformation during annealing of electroless Ni-Co-P alloy thin Film

    Anuj Kumar, Amanpal Singh, Satinder Kumar, Mukesh Kumar, B. Prasad and Dinesh Kumar; National Conference on Photonics & Material Science, Guru Jambheshwer University, Hisar, Haryana, India, October 24-25, 2008.

  38. Deposition and characterization of electroless Ni-Co-P alloy thin film

    Anuj Kumar, Amanpal Singh, Satinder Kumar, Mukesh Kumar, B. Prasad and D. Kumar; Gurukula Kangri Vishwavidyalaya Haridwar India, 16-18 October, 2008.

  39. Experimental Determination of Threshold Voltage Shift in Submicron Devices

    Satinder K. Sharma, Anuj Kumar, B. Prasad and Dinesh Kumar; 52nd DAE Solid State Physics Symposium, Department of Studies in Physics, University of Mysore, MYSORE, from 27-31 December 2007.

  40. Electrical Characteristics of SiOxNy/HfO2 Stack Structure for High Performance Sub- micron CMOS Devices

    Satinder K. Sharma, B. Prasad and Dinesh Kumar; (INCCOM-6), International Conference on Future Trends in Composite Materials and Processing, at Indian Institute of Kanpur (U.P) from December 12-14, 2007.

  41. 2006-2003

  42. Role of +19F Implanted to Grow Multiple Gate Oxides for Nano-CMOS Technology

    Satinder K. Sharma, B. Prasad, Dinesh Kumar and Rajkumar; International Conference on Micro and Nanotechnology held at University of Mouloud Mammeri Of TIZI-OUZOU, ALGERIA, November 19-23, 2006. http://aphysrev.ictp.it/index.php/aphysrev/article/viewArticle/247.

  43. Effectof Post Metallization Annealing on hysterisis of C-V and G-V characteristics of PECVD deposited silicon oxynitride thin films

    Satinder K. Sharma,Dinesh Kumar and B.Prasad; National Conference held at Kurukshetra University, Sep. 2006.

  44. High Frequency Simultaneous Measurement for Rapid Characterization of MIS Structure

    Satinder K. Sharma, Anil Dutt,B. Prasad, Dinesh Kumar and P.J.George; National Conference On Recent Advances in Process Control & Instrumentation Engineering held at Kurukshetra University, February 23-25, 2006.

  45. Impact of Post-metallization annealing on the Fluorinated Ultra Thin Gate Oxide in Submicron MOS Devices

    Satinder K. Sharma, Rajkumar, B. Prasad, Dinesh Kumar and P.J.George; Indian Microelectronics Society Conference held at Kurukshetra University, February 17-18, 2006.

  46. Application of Plasma Immersion Ion Implantation Technique for Oxynitride Growth as a Gate Dielectric in Sub Micron MOS Devices

    Satinder K. Sharma,B. Prasad, Dinesh Kumar and P.J.George; National Conference on Materials and Their Applications held at Kurukshetra University, 2004.

  47. Silicon Oxynitride-Future Gate Material

    Satinder K. Sharma, B. Prasad, Dinesh Kumar and P.J.George; National Conference on Materials and Related Technologies held at Thapar Institute of Engineering and Technology, Patiala, ep19-20, 2003. (Published as special proceedings)

Device Engineering Lab (DEL) Research Group & Members

    Present Graduate Students


  1. Mr. Mohamad Ghulam Moinuddin

    Year of Joining: 2016 (PhD)
    Research Area: CMOS compatible Spintronics devices and Nano Lithography
    Research Scholar, SCEE, IIT Mandi
    LinkedIn, Research Gate

  2. Mr. Sumit Choudhary

    Year of Joining: 2017 (PhD)
    Research Area: Germanium based FETs
    Research Scholar, SCEE, IIT Mandi
    Google Scholar

  3. Ms. Prachi Gupta

    Year of Joining: 2017 (PhD)
    Research Area: CMOS Logic devices, High-k dielectrics, 2D Materials based FETs
    Research Scholar, SCEE, IIT Mandi
    LinkedIn, Google Scholar, Research Gate

  4. Mr. Manoj Kumar Yadav

    Year of Joining: 2017 (PhD)
    Research Area: Ga2O3 based power semiconductor devices.
    Research Scholar, Indian Institute of Technology Mandi, Kamand
    Research Gate

  5. Mr. Manvender Singh Chauhan

    Year of Joining: 2019 (PhD)
    Research Area: Photoresist, Helium Ion Beam Lithography
    Research Scholar, SCEE, IIT Mandi

  6. Ms. Ramanpreet Kaur

    Year of Joining: 2019 (Master of Science by Research)
    Research Area: Design of Digital to analog Converter
    Research Scholar, Indian Institute of Technology Mandi, Kamand

  7. Mr. Rahul Sharma

    Year of Joining: 2019 (Master of Science by Research)
    Research Area:
    Research Scholar, Indian Institute of Technology Mandi, Kamand

    Past Graduate Students


  1. Dr. Robin Khosla

    Year of Graduation: 2017 (Doctor of Philosophy)
    Thesis: Alternate High-k Dielectrics for Next-Generation CMOS Logic and Memory Technology
    Current Position:
    Assistant Professor, NIT Silchar, Assam, India & Alexander von Humboldt Post Doc Fellow, Universitat, Stuttgart, Germany

    LinkedIn, Google Scholar, Research Gate

  2. Dr. Mahesh Soni

    Year of Graduation: 2018 (Doctor of Philosophy)
    Thesis: Graphene and Derivatives based Scaled Electronic and Memory Devices for Next Generation Technology
    Current Position:
    Post Doctoral Fellow, Lancaster University, Lancashire, United Kingdom

    LinkedIn, Google Scholar, Research Gate

  3. Dr. Ashish Joshi

    Year of graduation: 2020 (Doctor of Philosophy)
    Thesis: Multivalent Energy-Efficient CMOS Amplifiers and Data Converters for Signal Processing Applications LinkedIn, Google Scholar

  4. Dr. Shivani

    Year of graduation: 2020 (Doctor of Philosophy)
    Thesis: High-k Dielectrics for two dimensional Multilayer Hafnium Disulfide based Interdigitated Electrode based Field Effect Transistors: Next Generation Technology
    Google Scholar, Research Gate, LinkedIn

  5. Dr. Rudra Kumar

    Year of completion: 2020 (National Post Doctoral Fellow)
    Research Area: Electrochemistry, Energy Storage Devices, Photoresist Devices
    Current Position:
    Assistant Professor, Tecnolgico de Monterrey, Mexico

    Google Scholar, Research Gate

  6. Dr. Jerome Peter

    Year of completion: 2019 (National Post Doctoral Fellow)
    Research Area: Synthesis of Inorganic hybrid polymeric materials for lithographic applications
    Current Position: Post-Doctoral Researcher, Pusan National University, Busan, South Korea
    Google Scholar, Research Gate

  7. Dr. Subhasis Das

    Year of completion: 2019 (National Post Doctoral Fellow)
    Research Area: Gas Sensors, 2D Materials
    Current Position:
    Assistant Professor, Brainware University, Kolkata, India

    LinkedIn, Google Scholar, Research Gate

    Past Masters Students


  1. Mr. Saswath T

    Year of Graduation: 2020 (Master of Technology with specialization in VLSI)
    Thesis: Design of Variable gain low noise capaciatnce to voltage converter for vibratory gyroscope in space applications
    LinkedIn

  2. Mr. Diwakar Chauhan (co-supervised)

    Year of Graduation: 2019 (Master of Technology)
    Thesis: A low cost Reverse Electrowetting on dielectric (REWOD) System
    Current Position: Research Scholar,
    Indian Institute of Technology Mandi, Kamand

  3. Mr. Shivendra Rathaur

    Year of Graduation: 2018 (Master of Technology with specialization in VLSI)
    Thesis: Metal/Ferroelectric/Insulator/Semiconductor MFIS structure for Ferroelectric Memory Applications
    Current Position: Research Scholar,
    Indian Institute of Technology Delhi, Hauz Khas, Delhi

  4. Mr. Deepak Sharma

    Year of Graduation: 2014 (Master of Science by Research)
    Thesis: High-k TiOxNy based MFIS Structure for Next Generation FeRAM Applications
    Current Position: Scientist
    , Laboratory for Electro-Optics Systems (LEOS), ISRO, Bangalore, Govt. of India

    Google Scholar

    Masters Dissetation Supervised


  1. Ms. Jyoti Yadav

    Year of Graduation: 2018 Master of Science (Electronics)
    Thesis: High performance flexible PVDF Nanogenertor for portable electronic device Application.
    Institute: Kurukshetra University

  2. Mr. Nidhin S. Babu

    Year of Graduation: 2018 Master of Science (Electronics)
    Thesis: Sn. nanoparticles doped TiO2 nanofibres for high performance UV photodetectors
    Institute: Kurukshetra University

  3. Ms. Amrita Kaur

    Year of Graduation: 2017 (M.Tech)
    Thesis: Cordic Processor for performing Trignomtric Functions
    Institute: Kurukshetra University

  4. Mr. Atul Grewal

    Year of Graduation: 2017 (M.Tech)
    Thesis: Design of a 128Kb SRAM using 180nm Technology
    Institute: Kurukshetra University

  5. Ms. Chanchal Soni

    Year of Graduation: 2017 Master of Science (Electronics)
    Thesis: All Carbon based strain sensor.
    Institute: Kurukshetra University

  6. Mr. Mandeep Kumar

    Year of Graduation: 2017 Master of Science (Electronics)
    Thesis: MEMS based gyroscope
    Institute: Kurukshetra University

    B.tech Interns Supervised


  1. Ms. Smriti Verma

    Project:
    Institute:

  2. Ms. Surbhi

    Project: Thin film study of PVDF.
    Institute:
    Shri Mata Vaishno Devi University, Katra

  3. Mr. Suja

    Project: Modified synthesis of rGo
    Institute:

  4. Mr. Sidharth

    Project:
    Institute:

  5. Ms. Sunita

    Project: Traffic Light controller.
    Institute:
    Baddi University of Emerging Sci. & Tech.

  6. Mr. Ajit

    Project: Solution compatible of SU8 photoresist
    Institute:
    National institute of technology, Hamirpur, (H.P)

Professional Activities & Memberships & Invited lectures


  • Fellow Member, The Institution of Electronics and Telecommunication Engineers (IETE), F500897, 2018.

  • Member, Photoresist Research Group.

  • International Visit
    "SPIE Advanced Lithography 2020", 23 - 27 February 2020, San Jose, California, United States.

  • International Visit
    "2nd ELENA: Low energy ELEctron driven chemistry for the advantage of emerging NAno-fabrication methods" at Interuniversity Microelectronics Centre (IMEC), September 4th - 6th, 2019, Leuven, Belgium.

  • Invited talk,
    "2nd International Conference on Soft Materials" (ICSM 2016), 12-16 December 2016, Jaipur, India.

  • Invited talk,
    National Conference on "Advances in Basic & Applied Sciences" (ABAS-2017), 07- 08 April, 2017 , Hamirpur, India.

Research Project/Awards


  1. Next Generation, Cutting-Edge Indigenous EUVL Resists Technology For Semiconductor Industry

    Technology System Development Program (TSDP), Department of Science & Technology (DST), Govt. of India, New Delhi,Principal Investigator (PI), 91 Lakhs, 2016-2020.

  2. Special Manpower Development Programme for Chips to System Design (SMDP)

    Department of Electronics & Information Technology 6, CGO Complex, New Delhi -110 003, Co-Investigator (Co-PI), 70 Lakhs, 2015-2020.

  3. Tailoring the nanoscale properties of Graphene and its derivatives via strain engineering for next generation nanoelectronics devices

    Department of Science & Technology (DST), (Nanomission), Govt. of India, New Delhi, Co-Investigator (Co-PI), 47 Lakhs, 2019-2022.

  4. Design and fabrication of an interface ASIC for a vibratory gyroscope sensor application

    Indian Space & Research Organization (ISRO),Dept. of Space, Govt. of India, Inertial Systems Unit (IISU), Vattiyoorkaavu, Thiruvananthapuram, 695013, Principal Investigator (PI); 49 Lakhs, 2018-2020.

  5. Low-Temperature Epitaxial Growth of High Mobility "Ge1-xSnx" Channel Materialfor "Pt/TiN/high- k/GeOXNY/Ge1-XSnX/Ge/Si" Transistor to the Integration of Next Generation CMOS and Optoelectronics Devices on Cost Effective Si Platform

    Department of Science and Technology (DST) Govt. of India, New Delhi & German Academic Exchange Service (DAAD), Germany, Principal Investigator (PI) from India; 80 Lakhs, 2018-2020.

  6. Indigenous Photoresists Technology for Semiconductor Industries: Impact on Indian Economy, Skilled Manpower Development and Employment Possibility

    Ministry of Human Resource Development (MHRD) (under Uchhatar Avishkar Yojana (UAY) scheme), Govt. of India, New Delhi, Co-Investigator (Co-PI), 239 Lakhs, 2016-2019.

  7. Radiation Impact on SiC based Devices for Space Applications

    Indian Institute of Technology (IIT) - Mandi (Himachal Pradesh)-175001 (Under Seed Grant Program), Principal Investigator (PI), 10 Lakhs, 2013-2017.

  8. Non Chemically Amplified Resists for EUVL at the 10 nm Node and Beyond

    Intel, Semiconductor Research Corporation, 1101 Slater Road, Brighton Hall, Suite 120, Durham, NC 27703, P.O. Box 12053, Research Triangle Park, NC-27709-2053, Co-Investigator (Co-PI), 250 Lakhs, 2012-2016.

  9. Photo Catalytic treatment of wastewater for removal of AZO dyes; using rGO-TiO2 based cost effective composite technology

    Himachal Pradesh Sate Council for Science ,Technology Enviroment (HIMCOST), Shimla, Principal Investigator (PI), 6 Lakhs.

  10. Surface Plasmon Based Flexible Colloidal Crystal Sensors

    DST Fast Track Young Scientist, Engineering Section from the Department of Science and Technology (DST), New Delhi, 2012-2015.

  11. Dye Sensitized Hybrid Solar Cells with Up-Conversion Nanostructures with Enhanced Efficiency

    PAN IIT-DST, Solar Energy Research Initiative from the Department of Science and Technology (DST), New Delhi, 2012-2014.

Employment & Education


  • Associate Professor in School of Computing and Electrical Engineering (SCEE) at Indian Institute of Technology (IIT)- Mandi, Himachal Pradesh, (India), 2016-Present.

  • Visiting Faculty, Institute of Semiconductor Electronics (IHT), Stuttgart University, Stuttgart, Germany (BMBF Sponsored TU9 Faculty Exchange Program), 2014-2015

  • Assistant Professor in School of Computing and Electrical Engineering (SCEE) at Indian Institute of Technology (IIT)- Mandi, Himachal Pradesh, (India), 2012-2016.

  • Assistant Professor in Electronics and Microelectronics Division at Indian Institute of Information Technology-(IIIT)-Allahabad, (India), 2010-2012.

  • Research Scientist, in DST Unit on Nanosciences at Indian Institute of Technology (IIT)- Kanpur, (India) from 2007-2010.

  • Post Doctoral (PDF) in Nano Science and Nanotechnology (DST Unit on Nanosciences) at Indian Institute of Technology (IIT)-Kanpur, 2007- 2010.

  • Doctor of Philosophy (Ph.D.) in VLSI Technology from Electronics Science Department, Kurukshetra University, Kurukshetra, 2002-2007.

  • Master in Science (M.Sc.) Physics (Electronics Science) from department of Physics, Himachal Pradesh University, Shimla, 2000-2002.

Open Positions in Research Group

Interested candidates are requested to send me an email satinder@iitmandi.ac.in with their updated CV and a one-page statement of purpose.
.